photoresist
英
[fəʊtəʊrɪ'zɪst]
美
[ˌfoʊtoʊrɪ'zɪst]
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用作名词 (n.)
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The groove width is reduced by employing a slope-etching process to form the photoresist pattern.
通过采用倾斜蚀刻工艺形成光致抗蚀剂图案,从而减小了凹槽的宽度。
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A method of removing a photoresist or a photoresist residue from a semiconductor substrate is disclosed.
公开了从半导体基底上去除光致抗蚀剂或者光致抗蚀残留物的一种方法。
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Thereafter, the patterned photoresist layer is removed.
此后,移除图案化光刻胶层。
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Rectangular photoresist gratings can be fabricated by taking advantage of the nonlinearity of photoresist.
利用光刻胶的非线性效应可以制作出了矩形的全息光栅。
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