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- SU-8光刻胶 SU-8 photoresist
- SU-8光刻胶氧刻蚀的研究 Study on Deep Reactive Ion Etching of SU-8 Photoresist
- 该传感器采用微电子机械系统(MEMS)技术制备,以硅片作为基底,由铂制备的平面双电极结构以及SU-8光刻胶制备的微反应池所构成。 The sensor, which is composed of two electrodes made of platinum and a micro reaction cell made of SU-8 photoresist, is fabricated on silicon wafer using the Micro-Electro-Mechanical Systems (MEMS) technology.
- SU-8光胶 SU - 8 photoresist
- 光刻胶 photosensitive resist
- H_2O_2、K_2S_2O_8光降解有机磷DDVP的研究 Study on the Photodegradation of Organophosphrus DDVP
- 光刻 photoetching
- 光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响 The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms
- 特邀演讲:将离子注入和光刻胶剥离后的衬底损失降低到超低程度 Invited Speech: Ultra Low Substrate Loss Post Implant Strip Processes
- X射线光刻胶 X-ray resist
- 厚胶光刻 Lithography for thick film photo-resists
- 正性胶光刻 positive resist lithography
- 用近贴式软X射线光刻术研究DCPA光刻胶的曝光性能 INVESTIGATION ON EXPOSURE CHARACTERISTICS 0F SOFT-X-RAY RESIST DCPA USING SOFT X-RAY CONTACT LITHOGRAPHY
- 紫外线厚胶光刻技术研究及应用 Research and application of thick photoresist lithography using UV light
- 紫外压印光刻中阻蚀胶残膜刻蚀工艺 Etching Process for Residual Resist Layer in Ultraviolet-Imprint Lithography
- 化学放大胶在电子束光刻技术中的应用 Application of chemically amplified resists in electron beam lithography
- 压印光刻对准中阻蚀胶层的设计及优化 Design and Optimization of Resist Film in Imprint Lithography Alignment Process
- SU-8厚胶光刻 SU-8 thick photorcsist
- 厚胶光刻中曝光光强对光化学反应速率的影响 Exposure intensity effect on the photochemical reaction speed in the lithography for thick film photo-resists
- 光刻胶附着 resist adhesion
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