Theoretical research and computer simulation show that the new IIL can obtain higher resolution and better resist patterns as well as decrease position error of patterns out of focusing.

• 理论和计算模拟表明，该方法可以提高图形对比度和分辨力，并减小因调焦误差引起的图形横向位移误差，有利于改善抗蚀剂图形质量。