The nanosecond pulsed laser annealing of GDa-Si:H films has been studied by scanning electron microscope,X-ray diffraction and infrared absorption.

• 本文报道用电子显微镜观察、X-射线衍射和红外吸收谱等方法研究 a-Si:H 薄膜的毫微秒(ns)脉冲激光退火的结果。