The effects of chromium concentration,a number of carboxlic acids,a group of buffers,temperature and solution pH on deposition rate,deposit thickness and the ability to plate continuously have been investigated.

• 此项工艺研究了铬液浓度、多种羧酸、一组缓冲剂、温度和溶液pH值这些因素对沉积速度、镀层厚度和连续电镀能力的影响。