The chemical properties of the thin films with cifferent [Si]/[C] ratiocsare compared and discussed on the basis of the experimental Si LVV and C KLL Auger Spec-trum.

• 根据实验获得的Si LVV和CKLL俄歇谱比较和讨论了不同[Si]/[C]浓度比薄膜的化学特征.