The GOI surface roughness is reduced by thermal rapid annealing with hydrogen gas in furnace, and hydrogen annealing is obvious and promising to reduce SOI and GOI surface roughness.

• 利用炉管高温下进行氢气热退火使绝缘层上锗的表面粗糙度减少，由实验结果看来氢气热退火有显著且有效的降低绝缘层上锗、矽的表面粗糙度。