Standard Test Method for Separating an Ionizing Radiation-Induced MOSFET Threshold Voltage Shift Into Components Due to Oxide Trapped Holes and Interface States Using the Subthreshold Current-Voltage Characteristics

• 利用次临界伏安特性测定由于氧化空穴和界面性能产生的电离辐射感生金属氧化物半导体场应晶体管临界电压偏移分量的试验方法