Optimal depositing parameters,IR absorption spectroscopy,variation of optical band gap Eopt with x,ESCA results of the a-SixC1-x:H films propeared by glow discharge deposition of SiH_4 and CH_4 mixture are presented.

• 本文主要介绍了应用SiH_4+CH_4的辉光放电法制备光电性能优良的a-si_xC_(1-x):H薄膜的最佳工艺条件、红外吸收谱、光隙E_(opt)同x的关系以及ESCA测量结果。