In this paper, non-hydrogen DLC antireflective films deposited by UBMS technology are studied on the base of correlation experiments.The main factors and the best technology parameters were gained.

• 本文利用正交实验方法，对非平衡磁控溅射技术制备无氢DLC膜增透膜进行了研究，得到了影响薄膜光学性能的主要因素和最佳的制备工艺。