In this article, two mathods of NP( HNO3: H3PO4: de-ionized H2O =1:70:29) and BM (Br: Methanol=0.02:100) were used to etch the CdTe films repectively for 60s and 10s.

• BM腐蚀液浓度为溴0.；02ml+甲醇100ml；腐蚀时间为10s左右。 NP溶液浓度为硝酸1%25+磷酸70%25+去离子水29%25；腐蚀时间为60s。