Fluorinated diamond-like carbon(F-DLC) films were grown by RF plasma enhanced chemical vapor deposition(PECVD) in a gas mixture of CF4 and CH4 and annealed in Ar environment.

• 以CF4和CH4为源气体,利用射频等离子体增强化学气相沉积法,在不同条件下制备了氟化类金刚石(F-DLC)薄膜,并进行了退火处理。