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- During the layerout cutting process for the e beam lithography system, some polygons with one or more inner holes may appear. 电子束曝光机版图切割过程中可能出现带内孔的多边形,并且多边形内环与外环之间可能发生重叠。
- The Ee-BES-40A electron beam lithography system manufactured by the Varian Co. in U.S.and imported by IEE of Academia Sinica is a second-hand machine. 本Be－BES－40A电子束曝光机是电工所引进美国Varian公司的二手设备。
- ITRI MIRL has a high resolution electron beam lithography (EBL)system, which has the ability to exposure the nano-scale patterns. 工研院机械所拥有之电子束直写机为具有高解析度微影系统，可用以曝写奈米尺寸之图形。
- It can transfer the patterns onto the much thicker photoresist layer by common photo lithography machine and large aspect ratio can be obtained. 利用此技术，可以用普通光学曝光机将光刻图形转移到较厚的光刻胶上，而且深宽比可以做得很大。
- The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced. 本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
- Some progress on top-down nano-fabrication, such as electron beam lithography,X-ray lithography and EUV lithography were introduced. 介绍了电子束曝光技术、EUV光刻技术和X射线光刻技术的进展;
- The design of the prism for super-high transmittance of e beam with the Brewster incident angle was described. 叙述以布儒斯特角入射来提高偏光棱镜e光透射比的设计方案。
- High k dielectric HfO 2 films were deposited on p type Si(100) substrates by e beam evaporation. 使用高真空电子束蒸发在p型Si(1 0 0 )衬底上制备了高kHfO2 薄膜 .
- Electron beam lithography lays down circuit patterns more slowly than photolithography does, because it generates patterns serially instead of in parallel. 电子束微影制程布设电路图样时，比光刻技术慢，因为它是以循序而非平行方式产生图样。
- The formulation and simulation of the refraction of e beam within the principal cross section of a uniaxial crystal in accordance with the Huygen's principle and by MATLAB,respectively. 应用惠更斯原理可推导主截面内折射角公式和阵面角公式,这是分析和演示双折射现象的基础;
- The development of lithography machines decides the development of semiconductor manufacturing technology. 步进扫描光刻机在工作状态下振动特性的好坏对其性能起着重要作用。
- Laser Stage System for E-Beam Lithography Machine 电子束曝光机激光工件台系统研制
- Deflection system for electron beam lithography 电子束曝光机的偏转系统
- Focused Ion Beam Lithography Technology 聚焦离子束曝光技术
- vector scan electron beam lithography 矢量扫描电子束光刻
- raster scan electron beam lithography 光栅扫描电子束光刻
- Measurement System of Laser Stage for E-Beam Lithography Machine 电子束曝光机激光工件台测量系统研究
- direct write electron beam lithography 直写式电子束光刻
- electron beam bonding (E beam bonding) 电子束压焊
- electron beam lithography system 电子束曝光装置
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海词词典，十七年品牌
