Due to the natural of O2 plasma ash (high energy) and wet bench process (high material loss and low PRE), some novel method for LDD loop PR strip clean is evaluated.

• 因为O2等离子灰化（高能量）和湿槽工艺（高材料损失和低PRE）的本性使然，一些 LDD回路PR去除清洗的新方法开始被评估。