Chemical vapor deposition technique(CVD)is available to making highadherent,dense(non-porous)and fine grain platinum metals coatings on the surfaces of refractory metals such as Mo,Re and W et al .

• 化学气相沉积 (ChemicalVaporDeposition ,CVD)技术可用在高熔点金属如Mo、Re、W等表面制备结合力好的铂族金属涂层。