CN x films on silicon (111) wafer, quartz and Ti/C substrate with nitrogen concentration up to 20 at% have been prepared by a new plasma deposition technique, filtered arc deposition.

• 本文采用真空磁过滤弧沉积技术，在Si（111）、石英及Ti/C衬底上制备得到非晶碳氮（CNx）薄膜。