Bi 4Ti 3O 12 ferroelectric thin films were prepared on Si(100)substrates by chemical solution deposition (CSD). The results of X ray diffraction (XRD)patterns show the films have good orientation.

• 本文采用化学溶液沉积 (CSD)工艺在Si(10 0 )衬底上制备了Bi4 Ti3O12 铁电薄膜 ,这种薄膜的X射线衍射 (XRD)结果显示其具有较好的结晶性。