用磁控溅射低温沉积镀膜技术制做锰铜薄膜 ,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性。

• Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.